Novel post-etching treatment of small windows in oxide for selective epitaxial growth

JWH Maes, J Caro, CCG Visser, T Zijlstra, EWJM van der Drift, S Radelaar, FD Tichelaar, EJM Fakkeldij

Research output: Contribution to journal › Article › Scientific › peer-review

Cite this

@article{53314713729144b1ac403786f3d68696,

title = "Novel post-etching treatment of small windows in oxide for selective epitaxial growth",

author = "JWH Maes and J Caro and CCG Visser and T Zijlstra and {van der Drift}, EWJM and S Radelaar and FD Tichelaar and EJM Fakkeldij",

year = "1997",

language = "Undefined/Unknown",

volume = "70",

pages = "973--975",

journal = "Applied Physics Letters",

issn = "0003-6951",

publisher = "American Institute of Physics Publising LLC",

}

TY - JOUR

T1 - Novel post-etching treatment of small windows in oxide for selective epitaxial growth

AU - Maes, JWH

AU - Caro, J

AU - Visser, CCG

AU - Zijlstra, T

AU - van der Drift, EWJM

AU - Radelaar, S

AU - Tichelaar, FD

AU - Fakkeldij, EJM

PY - 1997

Y1 - 1997

M3 - Article

SN - 0003-6951

VL - 70

SP - 973

EP - 975

JO - Applied Physics Letters

JF - Applied Physics Letters

ER -