| Original language | Undefined/Unknown |
|---|---|
| Pages (from-to) | 5-9 |
| Number of pages | 5 |
| Journal | Ultra Clean Technology |
| Volume | 8 |
| Issue number | 1 |
| Publication status | Published - 1996 |
Numerical modelling of chemical vapor deposition as a tool for process optimisation and reactor design
Research output: Contribution to journal › Article › Scientific › peer-review