Numerical simulation of flow and chemistry in Chemical Vapor Deposition Processes

Research output: Chapter in Book/Conference proceedings/Edited volume › Chapter › Scientific

Original language	Undefined/Unknown
Title of host publication	Chemical physics of thin film deposition processes for micro- and nanotechnologies. NATO Science Series.
Editors	Y Pauleau
Place of Publication	Dordrecht
Publisher	Kluwer
Pages	119-144
Number of pages	25
ISBN (Print)	1-4020-0525-3
Publication status	Published - 2002

Keywords

@inbook{4d9d7a5b4edf452d851b29c491d67d20,

title = "Numerical simulation of flow and chemistry in Chemical Vapor Deposition Processes",

keywords = "Boekdeel internat.wet",

author = "CR Kleijn",

year = "2002",

language = "Undefined/Unknown",

isbn = "1-4020-0525-3",

pages = "119--144",

editor = "Y Pauleau",

booktitle = "Chemical physics of thin film deposition processes for micro- and nanotechnologies. NATO Science Series.",

publisher = "Kluwer",

}