@inproceedings{f714be10cb2b4ed99a944c3655abc801,
title = "Objective function and adjoint sensitivities for moving-mask lithography",
keywords = "conference contrib. refereed, Conf.proc. > 3 pag",
author = "{van Keulen}, F and Y Hirai and O Tabata",
year = "2008",
language = "Undefined/Unknown",
publisher = "American Institute of Aeronautics and Astronautics Inc. (AIAA)",
pages = "1--19",
editor = "s.n.",
booktitle = "12th AIAA/ISSMO Multidisciplinary Analysis and Optimization Conference",
address = "United States",
note = "12th AIAA/ISSMO Multidisciplinary Analysis and Optimization Conference ; Conference date: 10-09-2008 Through 12-09-2008",
}