Objective function and adjoint sensitivities for moving-mask lithography

F van Keulen, Y Hirai, O Tabata

Research output: Chapter in Book/Conference proceedings/Edited volumeConference contributionScientific

3 Citations (Scopus)
Original languageUndefined/Unknown
Title of host publication12th AIAA/ISSMO Multidisciplinary Analysis and Optimization Conference
Editors s.n.
Place of Publications.l.
PublisherAmerican Institute of Aeronautics and Astronautics Inc. (AIAA)
Pages1-19
Number of pages19
Publication statusPublished - 2008
Event12th AIAA/ISSMO Multidisciplinary Analysis and Optimization Conference - s.l.
Duration: 10 Sep 200812 Sep 2008

Publication series

Name
PublisherThe American Institute of Aeronautics and Astronautics, 2008

Conference

Conference12th AIAA/ISSMO Multidisciplinary Analysis and Optimization Conference
Period10/09/0812/09/08

Keywords

  • conference contrib. refereed
  • Conf.proc. > 3 pag

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