On resistive open defect detection in DRAMs: The charge accumulation effect

Y Sfikas; YE Tsiatouhas; M Taouil; S Hamdioui

doi:10.1109/ETS.2015.7138747

On resistive open defect detection in DRAMs: The charge accumulation effect

Y Sfikas, YE Tsiatouhas, M Taouil, S Hamdioui

Computer Engineering

Research output: Chapter in Book/Conference proceedings/Edited volume › Conference contribution › Scientific › peer-review

Original language	English
Title of host publication	Proceedings - 20th IEEE European Test Symposium
Editors	L Miclea, P Prinetto
Place of Publication	Piscataway, NJ, USA
Publisher	IEEE
Pages	1-6
Number of pages	6
ISBN (Print)	978-1-4799-7603-4
DOIs	https://doi.org/10.1109/ETS.2015.7138747
Publication status	Published - 2015
Event	ETS 2015, Cluj-Napoca, Romania - Piscataway, NJ, USA Duration: 25 May 2015 → 29 May 2015

Publication series

Name
Publisher	IEEE

Conference

Conference	ETS 2015, Cluj-Napoca, Romania
Period	25/05/15 → 29/05/15

Bibliographical note

Harvest

Access to Document

10.1109/ETS.2015.7138747

Cite this

@inproceedings{ae5bda546d1941fd97d6635823362f45,

title = "On resistive open defect detection in DRAMs: The charge accumulation effect",

author = "Y Sfikas and YE Tsiatouhas and M Taouil and S Hamdioui",

note = "Harvest; ETS 2015, Cluj-Napoca, Romania ; Conference date: 25-05-2015 Through 29-05-2015",

year = "2015",

doi = "10.1109/ETS.2015.7138747",

language = "English",

isbn = "978-1-4799-7603-4",

publisher = "IEEE",

pages = "1--6",

editor = "L Miclea and P Prinetto",

booktitle = "Proceedings - 20th IEEE European Test Symposium",

address = "United States",

}

TY - GEN

T1 - On resistive open defect detection in DRAMs: The charge accumulation effect

AU - Sfikas, Y

AU - Tsiatouhas, YE

AU - Taouil, M

AU - Hamdioui, S

N1 - Harvest

PY - 2015

Y1 - 2015

U2 - 10.1109/ETS.2015.7138747

DO - 10.1109/ETS.2015.7138747

M3 - Conference contribution

SN - 978-1-4799-7603-4

SP - 1

EP - 6

BT - Proceedings - 20th IEEE European Test Symposium

A2 - Miclea, L

A2 - Prinetto, P

PB - IEEE

CY - Piscataway, NJ, USA

T2 - ETS 2015, Cluj-Napoca, Romania

Y2 - 25 May 2015 through 29 May 2015

ER -