On the effects of implantation temperature in helium implanted silicon

E Oliviero, ML David, MF Beaufort, JF Barbot, A van Veen

    Research output: Contribution to journalArticleScientificpeer-review

    28 Citations (Scopus)
    Original languageUndefined/Unknown
    Pages (from-to)4201-4203
    Number of pages3
    JournalApplied Physics Letters
    Volume81
    Publication statusPublished - 2002

    Keywords

    • ZX CWTS 1.00 <= JFIS < 3.00

    Cite this

    Oliviero, E., David, ML., Beaufort, MF., Barbot, JF., & van Veen, A. (2002). On the effects of implantation temperature in helium implanted silicon. Applied Physics Letters, 81, 4201-4203.