On the influence of the sputtering in determining the resolution of a Scanning Ion Microscope

V Castaldo, CW Hagen, P Kruit, E van Veldhoven, D Maas

Research output: Contribution to journal › Article › Scientific › peer-review

Original language	Undefined/Unknown
Pages (from-to)	3196-3202
Number of pages	7
Journal	Journal of Vacuum Science and Technology. Part B: Microelectronics and Nanometer Structures
Volume	27
Issue number	6
Publication status	Published - 2009

Keywords

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title = "On the influence of the sputtering in determining the resolution of a Scanning Ion Microscope",

keywords = "CWTS JFIS < 0.75",

author = "V Castaldo and CW Hagen and P Kruit and Veldhoven, {E van} and D Maas",

year = "2009",

language = "Undefined/Unknown",

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pages = "3196--3202",

journal = "Journal of Vacuum Science and Technology. Part B: Microelectronics and Nanometer Structures",

issn = "1071-1023",

publisher = "AVS Science and Technology Society",

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TY - JOUR

T1 - On the influence of the sputtering in determining the resolution of a Scanning Ion Microscope

AU - Castaldo, V

AU - Hagen, CW

AU - Kruit, P

AU - Veldhoven, E van

AU - Maas, D

PY - 2009

Y1 - 2009

KW - CWTS JFIS < 0.75

M3 - Article

SN - 1071-1023

VL - 27

SP - 3196

EP - 3202

JO - Journal of Vacuum Science and Technology. Part B: Microelectronics and Nanometer Structures

JF - Journal of Vacuum Science and Technology. Part B: Microelectronics and Nanometer Structures

IS - 6

ER -