Engineering
Digital Micromirror Device
100%
Grayscale
100%
Lithography
100%
Optimization Method
100%
Optical Lithography
100%
Photoresist
75%
Development
75%
Microstructure
50%
Multiple Exposure
50%
Process Parameter
50%
Target Area
25%
Lookup Table
25%
Microfabrication
25%
Optimization
25%
Error
25%
Optimization Approach
25%
Simulated Result
25%
Sensitivity Analysis
25%
Numerical Optimization
25%
Output Parameter
25%
Experiments
25%
Focal Position
25%
Accuracy
25%
Keyphrases
Lithography Process
100%
3D Lithography
100%
Multiple Exposures
75%
Exposure Optimization
75%
Lithography Simulation
25%
Depth Dose
25%
Maskless Process
25%
Error Adjustment
25%
Output Parameters
25%
Parameter Determination
25%
INIS
optimization
100%
devices
100%
precision
28%
doses
28%
microstructure
28%
simulation
28%
tools
28%
adjustments
14%
sensitivity analysis
14%
values
14%
films
14%
output
14%
accuracy
14%
errors
14%
cost
14%
tables
14%
depth
14%
gold
14%
Material Science
Devices
100%
Lithography
100%
Microstructure
50%
Microfabrication
25%
Thick Films
25%
Chemical Engineering
Lithography
100%
Microfabrication
25%