Optimizing chemical mechanical polishing process in 3D-IC

J Derakhshandeh Kheljani; MR Tajari Mofrad; R Ishihara; CIM Beenakker; J van der Cingel

Optimizing chemical mechanical polishing process in 3D-IC

J Derakhshandeh Kheljani, MR Tajari Mofrad, R Ishihara, CIM Beenakker, J van der Cingel

Electronic Components, Technology and Materials

Research output: Chapter in Book/Conference proceedings/Edited volume › Conference contribution › Scientific › peer-review

Original language	Undefined/Unknown
Title of host publication	The annual workshop on semiconductor advances for future electronics and sensors
Editors	s.n.
Place of Publication	Veldhoven, the Netherlands
Publisher	STW
Pages	461-464
Number of pages	4
ISBN (Print)	978-90-73461-56-7
Publication status	Published - 2008
Event	SAFE 2008, Veldhoven, the Netherlands - Veldhoven, the Nederlands Duration: 27 Nov 2008 → 28 Nov 2008

Publication series

Name
Publisher	STW

Conference

Conference	SAFE 2008, Veldhoven, the Netherlands
Period	27/11/08 → 28/11/08

Keywords

conference contrib. non-refer.
Vakpubl., Overig wet. > 3 pag

Cite this

@inproceedings{79d32c185d0643cb88c240cf768131e8,

title = "Optimizing chemical mechanical polishing process in 3D-IC",

keywords = "conference contrib. non-refer., Vakpubl., Overig wet. > 3 pag",

author = "{Derakhshandeh Kheljani}, J and {Tajari Mofrad}, MR and R Ishihara and CIM Beenakker and {van der Cingel}, J",

year = "2008",

language = "Undefined/Unknown",

isbn = "978-90-73461-56-7",

publisher = "STW",

pages = "461--464",

editor = "s.n.",

booktitle = "The annual workshop on semiconductor advances for future electronics and sensors",

note = "SAFE 2008, Veldhoven, the Netherlands ; Conference date: 27-11-2008 Through 28-11-2008",

}

Optimizing chemical mechanical polishing process in 3D-IC. / Derakhshandeh Kheljani, J; Tajari Mofrad, MR; Ishihara, R et al.
The annual workshop on semiconductor advances for future electronics and sensors. ed. / s.n. Veldhoven, the Netherlands: STW, 2008. p. 461-464.

Research output: Chapter in Book/Conference proceedings/Edited volume › Conference contribution › Scientific › peer-review

TY - GEN

T1 - Optimizing chemical mechanical polishing process in 3D-IC

AU - Derakhshandeh Kheljani, J

AU - Tajari Mofrad, MR

AU - Ishihara, R

AU - Beenakker, CIM

AU - van der Cingel, J

PY - 2008

Y1 - 2008

KW - conference contrib. non-refer.

KW - Vakpubl., Overig wet. > 3 pag

M3 - Conference contribution

SN - 978-90-73461-56-7

SP - 461

EP - 464

BT - The annual workshop on semiconductor advances for future electronics and sensors

A2 - s.n., null

PB - STW

CY - Veldhoven, the Netherlands

T2 - SAFE 2008, Veldhoven, the Netherlands

Y2 - 27 November 2008 through 28 November 2008

ER -