Optimum dose for shot noise limited CD uniformity in E-beam lithography

P Kruit, S. Steenbrink, R Jager, MJJ Wieland

Research output: Contribution to journalArticleScientificpeer-review

37 Citations (Scopus)
Original languageUndefined/Unknown
Pages (from-to)2948-2955
Number of pages8
JournalJournal of Vacuum Science and Technology. Part B: Microelectronics and Nanometer Structures
Volume22
Issue number6
Publication statusPublished - 2004

Keywords

  • ZX CWTS 1.00 <= JFIS < 3.00

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