Optimum dose for shot noise limited CD uniformity in E-beam lithography

P Kruit, S. Steenbrink, R Jager, MJJ Wieland

    Research output: Contribution to journalArticleScientificpeer-review

    38 Citations (Scopus)
    Original languageUndefined/Unknown
    Pages (from-to)2948-2955
    Number of pages8
    JournalJournal of Vacuum Science and Technology. Part B: Microelectronics and Nanometer Structures
    Volume22
    Issue number6
    Publication statusPublished - 2004

    Keywords

    • ZX CWTS 1.00 <= JFIS < 3.00

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