@article{e6e05e4e080c415b9fb1beb9a563ff2a,
title = "Optimum dose for shot noise limited CD uniformity in E-beam lithography",
keywords = "ZX CWTS 1.00 <= JFIS < 3.00",
author = "P Kruit and S. Steenbrink and R Jager and MJJ Wieland",
year = "2004",
language = "Undefined/Unknown",
volume = "22",
pages = "2948--2955",
journal = "Journal of Vacuum Science and Technology. Part B: Microelectronics and Nanometer Structures",
issn = "1071-1023",
publisher = "AVS Science and Technology Society",
number = "6",
}