Oxidized ALD-deposited titanium nitride films as a low-temperature alternative for enhancing the wettability of through-silicon vias

M Saadaoui; HW van Zeijl; HTM Pham; HC MKnoops; WMM Kessels; MCM van de Sanden; F Roozeboom; Y Lamy; KB Jinesh; W. Besling; PM Sarro

Oxidized ALD-deposited titanium nitride films as a low-temperature alternative for enhancing the wettability of through-silicon vias

M Saadaoui, HW van Zeijl, HTM Pham, HC MKnoops, WMM Kessels, MCM van de Sanden, F Roozeboom, Y Lamy, KB Jinesh, W. Besling, PM Sarro

Electronic Components, Technology and Materials

Research output: Chapter in Book/Conference proceedings/Edited volume › Conference contribution › Scientific › peer-review

Original language	Undefined/Unknown
Title of host publication	MRS Proceedings Volume 1112, Materials and Technologies for 3-D Integration
Editors	F Roozeboom, C Bower
Place of Publication	Warrendale, PA, US
Publisher	MRS
Pages	1-8
Number of pages	8
ISBN (Print)	978-1-60511-084-4
Publication status	Published - 2009

Publication series

Name
Publisher	MRS

Name
Volume	1112

Keywords

Conf.proc. > 3 pag

Cite this

Saadaoui, M., van Zeijl, HW., Pham, HTM., MKnoops, HC., Kessels, WMM., van de Sanden, MCM., Roozeboom, F., Lamy, Y., Jinesh, KB., Besling, W., & Sarro, PM. (2009). Oxidized ALD-deposited titanium nitride films as a low-temperature alternative for enhancing the wettability of through-silicon vias. In F. Roozeboom, & C. Bower (Eds.), MRS Proceedings Volume 1112, Materials and Technologies for 3-D Integration (pp. 1-8). MRS.

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title = "Oxidized ALD-deposited titanium nitride films as a low-temperature alternative for enhancing the wettability of through-silicon vias",

keywords = "Conf.proc. > 3 pag",

author = "M Saadaoui and {van Zeijl}, HW and HTM Pham and HC MKnoops and WMM Kessels and {van de Sanden}, MCM and F Roozeboom and Y Lamy and KB Jinesh and W. Besling and PM Sarro",

year = "2009",

language = "Undefined/Unknown",

isbn = "978-1-60511-084-4",

publisher = "MRS",

pages = "1--8",

editor = "F Roozeboom and C Bower",

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Saadaoui, M, van Zeijl, HW, Pham, HTM, MKnoops, HC, Kessels, WMM, van de Sanden, MCM, Roozeboom, F, Lamy, Y, Jinesh, KB, Besling, W & Sarro, PM 2009, Oxidized ALD-deposited titanium nitride films as a low-temperature alternative for enhancing the wettability of through-silicon vias. in F Roozeboom & C Bower (eds), MRS Proceedings Volume 1112, Materials and Technologies for 3-D Integration. MRS, Warrendale, PA, US, pp. 1-8.

Oxidized ALD-deposited titanium nitride films as a low-temperature alternative for enhancing the wettability of through-silicon vias. / Saadaoui, M; van Zeijl, HW; Pham, HTM et al.
MRS Proceedings Volume 1112, Materials and Technologies for 3-D Integration. ed. / F Roozeboom; C Bower. Warrendale, PA, US: MRS, 2009. p. 1-8.

Research output: Chapter in Book/Conference proceedings/Edited volume › Conference contribution › Scientific › peer-review

TY - GEN

T1 - Oxidized ALD-deposited titanium nitride films as a low-temperature alternative for enhancing the wettability of through-silicon vias

AU - Saadaoui, M

AU - van Zeijl, HW

AU - Pham, HTM

AU - MKnoops, HC

AU - Kessels, WMM

AU - van de Sanden, MCM

AU - Roozeboom, F

AU - Lamy, Y

AU - Jinesh, KB

AU - Besling, W.

AU - Sarro, PM

PY - 2009

Y1 - 2009

KW - Conf.proc. > 3 pag

M3 - Conference contribution

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BT - MRS Proceedings Volume 1112, Materials and Technologies for 3-D Integration

A2 - Roozeboom, F

A2 - Bower, C

PB - MRS

CY - Warrendale, PA, US

ER -