Parameter calibration on post-implantation dopant diffusion

J Fu; W Crans; WJ Eysenga

Parameter calibration on post-implantation dopant diffusion

J Fu
, W Crans
, WJ Eysenga

Electronic Components, Technology and Materials

Research output: Chapter in Book/Conference proceedings/Edited volume › Conference contribution › Scientific › peer-review

2 Citations (Scopus)

Original language	Undefined/Unknown
Title of host publication	EuroSIME 2004; Proceedings of the Fifth international conference on thermal and mechanical simulation and experiments in micro-electronics and micro-systems
Editors	LJ Ernst, GQ Zhang, P Rodgers, O de Siant Leger
Place of Publication	Piscataway
Publisher	IEEE
Pages	191-198
Number of pages	8
ISBN (Print)	0-7803-8420-2
Publication status	Published - 2004
Event	Fifth international conference on thermal and mechanical simulation and experiments in micro-electronics and micro-systems, Brussels, Belgium - Piscataway Duration: 10 May 2004 → 12 May 2004

Publication series

Name
Publisher	IEEE

Conference

Conference	Fifth international conference on thermal and mechanical simulation and experiments in micro-electronics and micro-systems, Brussels, Belgium
Period	10/05/04 → 12/05/04

Keywords

Elektrotechniek
Techniek
Conf.proc. > 3 pag

Cite this

@inproceedings{e60eeb8fa919492ca10095fe1d3e167a,

title = "Parameter calibration on post-implantation dopant diffusion",

keywords = "Elektrotechniek, Techniek, Conf.proc. > 3 pag",

author = "J Fu and W Crans and WJ Eysenga",

year = "2004",

language = "Undefined/Unknown",

isbn = "0-7803-8420-2",

publisher = "IEEE",

pages = "191--198",

editor = "LJ Ernst and GQ Zhang and P Rodgers and \{de Siant Leger\}, O",

booktitle = "EuroSIME 2004; Proceedings of the Fifth international conference on thermal and mechanical simulation and experiments in micro-electronics and micro-systems",

address = "United States",

note = "Fifth international conference on thermal and mechanical simulation and experiments in micro-electronics and micro-systems, Brussels, Belgium ; Conference date: 10-05-2004 Through 12-05-2004",

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Fu, J, Crans, W & Eysenga, WJ 2004, Parameter calibration on post-implantation dopant diffusion. in LJ Ernst, GQ Zhang, P Rodgers & O de Siant Leger (eds), EuroSIME 2004; Proceedings of the Fifth international conference on thermal and mechanical simulation and experiments in micro-electronics and micro-systems. IEEE, Piscataway, pp. 191-198, Fifth international conference on thermal and mechanical simulation and experiments in micro-electronics and micro-systems, Brussels, Belgium, 10/05/04.

Parameter calibration on post-implantation dopant diffusion. / Fu, J; Crans, W; Eysenga, WJ.
EuroSIME 2004; Proceedings of the Fifth international conference on thermal and mechanical simulation and experiments in micro-electronics and micro-systems. ed. / LJ Ernst; GQ Zhang; P Rodgers; O de Siant Leger. Piscataway: IEEE, 2004. p. 191-198.

Research output: Chapter in Book/Conference proceedings/Edited volume › Conference contribution › Scientific › peer-review

TY - GEN

T1 - Parameter calibration on post-implantation dopant diffusion

AU - Fu, J

AU - Crans, W

AU - Eysenga, WJ

PY - 2004

Y1 - 2004

KW - Elektrotechniek

KW - Techniek

KW - Conf.proc. > 3 pag

M3 - Conference contribution

SN - 0-7803-8420-2

SP - 191

EP - 198

BT - EuroSIME 2004; Proceedings of the Fifth international conference on thermal and mechanical simulation and experiments in micro-electronics and micro-systems

A2 - Ernst, LJ

A2 - Zhang, GQ

A2 - Rodgers, P

A2 - de Siant Leger, O

PB - IEEE

CY - Piscataway

T2 - Fifth international conference on thermal and mechanical simulation and experiments in micro-electronics and micro-systems, Brussels, Belgium

Y2 - 10 May 2004 through 12 May 2004

ER -