Passive reticle tool, a lithographic apparatus and a method of patterning a device in a lithography tool

MA van de Kerkhof (Inventor), WP de Boeij (Inventor), HRM van Greevenbroek (Inventor), MFH Klaassen (Inventor), HV Kok (Inventor), MGD Wehrens (Inventor), T Uitterdijk (Inventor), WJM Rooijakkers (Inventor), JM Kuiper (Inventor), L van Dooren (Inventor), J Sonneveld (Inventor), EJM Giling (Inventor)

Research output: Patent

Original languageEnglish
Patent numberUS 2010/0182582 A1
IPCaangevraagd door ASML NL, Veldhoven (NL)
Priority date22/07/10
Publication statusPublished - 2010

Keywords

  • Octrooi
  • Geen VSNU-classificatie

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