Pattern transfer into silicon using sub-10 nm masks made by electron beam induced deposition

M Scotuzzi; MJ Kamerbeek; A Goodyear; M Cooke; CW Hagen

doi:10.1117/12.2085763

Pattern transfer into silicon using sub-10 nm masks made by electron beam induced deposition

M Scotuzzi, MJ Kamerbeek, A Goodyear, M Cooke, CW Hagen

Research output: Chapter in Book/Conference proceedings/Edited volume › Conference contribution › Scientific › peer-review

3 Citations (Scopus)

Original language	English
Title of host publication	Alternative Lithographic Technologies VII
Editors	DJ Resnick, C Bencher
Place of Publication	Bellingham, WA, USA
Publisher	SPIE
Pages	1-12
Number of pages	12
ISBN (Print)	9781628415254
DOIs	https://doi.org/10.1117/12.2085763
Publication status	Published - 2015
Event	Alternative Lithographic Technologies VII, San Jose, CA, USA - Bellingham, WA, USA Duration: 23 Feb 2015 → 26 Feb 2015

Publication series

Name
Publisher	SPIE

Name	Proceedings of SPIE- International Society for Optical Engineering
Volume	9423
ISSN (Print)	0277-786X

Conference

Conference	Alternative Lithographic Technologies VII, San Jose, CA, USA
Period	23/02/15 → 26/02/15

Bibliographical note

Harvest

Access to Document

10.1117/12.2085763

Cite this

Scotuzzi, M., Kamerbeek, MJ., Goodyear, A., Cooke, M., & Hagen, CW. (2015). Pattern transfer into silicon using sub-10 nm masks made by electron beam induced deposition. In DJ. Resnick, & C. Bencher (Eds.), Alternative Lithographic Technologies VII (pp. 1-12). (Proceedings of SPIE- International Society for Optical Engineering; Vol. 9423). SPIE. https://doi.org/10.1117/12.2085763

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title = "Pattern transfer into silicon using sub-10 nm masks made by electron beam induced deposition",

author = "M Scotuzzi and MJ Kamerbeek and A Goodyear and M Cooke and CW Hagen",

note = "Harvest; Alternative Lithographic Technologies VII, San Jose, CA, USA ; Conference date: 23-02-2015 Through 26-02-2015",

year = "2015",

doi = "10.1117/12.2085763",

language = "English",

isbn = "9781628415254",

publisher = "SPIE",

pages = "1--12",

editor = "DJ Resnick and C Bencher",

booktitle = "Alternative Lithographic Technologies VII",

address = "United States",

}

Scotuzzi, M, Kamerbeek, MJ, Goodyear, A, Cooke, M & Hagen, CW 2015, Pattern transfer into silicon using sub-10 nm masks made by electron beam induced deposition. in DJ Resnick & C Bencher (eds), Alternative Lithographic Technologies VII. Proceedings of SPIE- International Society for Optical Engineering, vol. 9423, SPIE, Bellingham, WA, USA, pp. 1-12, Alternative Lithographic Technologies VII, San Jose, CA, USA, 23/02/15. https://doi.org/10.1117/12.2085763

Pattern transfer into silicon using sub-10 nm masks made by electron beam induced deposition. / Scotuzzi, M; Kamerbeek, MJ; Goodyear, A et al.
Alternative Lithographic Technologies VII. ed. / DJ Resnick; C Bencher. Bellingham, WA, USA: SPIE, 2015. p. 1-12 (Proceedings of SPIE- International Society for Optical Engineering; Vol. 9423).

Research output: Chapter in Book/Conference proceedings/Edited volume › Conference contribution › Scientific › peer-review

TY - GEN

T1 - Pattern transfer into silicon using sub-10 nm masks made by electron beam induced deposition

AU - Scotuzzi, M

AU - Kamerbeek, MJ

AU - Goodyear, A

AU - Cooke, M

AU - Hagen, CW

N1 - Harvest

PY - 2015

Y1 - 2015

UR - http://resolver.tudelft.nl/uuid:23d59081-89ca-4774-b6d3-774a72d7997a

U2 - 10.1117/12.2085763

DO - 10.1117/12.2085763

M3 - Conference contribution

SN - 9781628415254

SP - 1

EP - 12

BT - Alternative Lithographic Technologies VII

A2 - Resnick, DJ

A2 - Bencher, C

PB - SPIE

CY - Bellingham, WA, USA

T2 - Alternative Lithographic Technologies VII, San Jose, CA, USA

Y2 - 23 February 2015 through 26 February 2015

ER -

Pattern transfer into silicon using sub-10 nm masks made by electron beam induced deposition

Publication series

Conference

Bibliographical note

Access to Document

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Cite this