Pattern transfer into silicon using sub-10 nm masks made by electron beam induced deposition

M Scotuzzi, MJ Kamerbeek, A Goodyear, M Cooke, CW Hagen

    Research output: Chapter in Book/Conference proceedings/Edited volumeConference contributionScientificpeer-review

    3 Citations (Scopus)
    Original languageEnglish
    Title of host publicationAlternative Lithographic Technologies VII
    EditorsDJ Resnick, C Bencher
    Place of PublicationBellingham, WA, USA
    PublisherSPIE
    Pages1-12
    Number of pages12
    ISBN (Print)9781628415254
    DOIs
    Publication statusPublished - 2015
    EventAlternative Lithographic Technologies VII, San Jose, CA, USA - Bellingham, WA, USA
    Duration: 23 Feb 201526 Feb 2015

    Publication series

    Name
    PublisherSPIE
    NameProceedings of SPIE- International Society for Optical Engineering
    Volume9423
    ISSN (Print)0277-786X

    Conference

    ConferenceAlternative Lithographic Technologies VII, San Jose, CA, USA
    Period23/02/1526/02/15

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