Patterning of fine-features in nanoporous films synthesized by spark ablation

Xinrui Ji, Hendrik Joost van Ginkel, Dong Hu, Andreas Schmidt-Ott, Henk van Zeijl, Sten Vollebregt, Guoqi Zhang*

*Corresponding author for this work

Research output: Chapter in Book/Conference proceedings/Edited volumeConference contributionScientificpeer-review

1 Citation (Scopus)
19 Downloads (Pure)


Advances in semiconductor device manufacturing technologies are enabled by the development and application of novel materials. Especially one class of materials, nanoporous films, became building blocks for a broad range of applications, such as gas sensors and interconnects. Therefore, a versatile fabrication technology is needed to integrate these films and meet the trend towards device miniaturization and high integration density. In this study, we developed a novel method to pattern nanoporous thin films with high flexibility in material selection. Herein, Au and ZnO nanoparticles were synthesized by spark ablation and printed on a Ti/TiO2 adhesion layer, which was exposed by a lithographic stencil mask. Subsequently, the photoresist was stripped by a cost-efficient lift-off process. Nanoporous patterned features were thus obtained and the finest feature has a gap width of 0.6 μ fm and a line width of 2 μ fm. Using SEM and profilometers to investigate the structure of the films, it was demonstrated that the lift-off process had a minor impact on the microstructure and thickness. The samples presented a rough surface and high porosity, indicating a large surface-to-volume ratio. This is supported by the measured conductivity of Au nanoporous film, which is 12% of the value for bulk Au. As lithographic stencil printing is compatible with conventional lithographic pattering, this method enables further application on mass production of various nanoporous film-based devices in the future.

Original languageEnglish
Title of host publicationProceedings of the 2022 IEEE 22nd International Conference on Nanotechnology (NANO)
Number of pages4
ISBN (Electronic)978-1-6654-5225-0
ISBN (Print)978-1-6654-5226-7
Publication statusPublished - 2022
Event2022 IEEE 22nd International Conference on Nanotechnology (NANO) - Palma de Mallorca, Spain
Duration: 4 Jul 20228 Jul 2022


Conference2022 IEEE 22nd International Conference on Nanotechnology (NANO)
City Palma de Mallorca

Bibliographical note

Green Open Access added to TU Delft Institutional Repository 'You share, we take care!' - Taverne project

Otherwise as indicated in the copyright section: the publisher is the copyright holder of this work and the author uses the Dutch legislation to make this work public.


  • Nanoporous film
  • Spark ablation
  • Nanoparticle
  • Lift-off
  • Nanofabrication


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