Perovskite thin films via atomic layer deposition

Brandon R. Sutherland, Sjoerd Hoogland, Michael M. Adachi, Pongsakorn Kanjanaboos, Chris T O Wong, Jeffrey J. McDowell, Jixian Xu, Oleksandr Voznyy, Zhijun Ning, Arjan J. Houtepen, Edward H. Sargent

Research output: Contribution to journalArticleScientificpeer-review

149 Citations (Scopus)

Abstract

(Graph Presented) A new method to deposit perovskite thin films that benefit from the thickness control and conformality of atomic layer deposition (ALD) is detailed. A seed layer of ALD PbS is place-exchanged with PbI2 and subsequently CH3NH3PbI3 perovskite. These films show promising optical properties, with gain coefficients of 3200 ± 830 cm-1.

Original languageEnglish
Pages (from-to)53-58
Number of pages6
JournalAdvanced Materials
Volume27
Issue number1
DOIs
Publication statusPublished - 7 Jan 2015

Keywords

  • Atomic layer deposition
  • Optical gain
  • Perovskites
  • Transient absorption

Fingerprint

Dive into the research topics of 'Perovskite thin films via atomic layer deposition'. Together they form a unique fingerprint.

Cite this