Photoelectrochemical characterization of sprayed alpha-Fe2O3 thin films: influence of Si doping and SnO2 interfacial layer

Y Liang, C.S. Enache, R van de Krol

Research output: Contribution to journal › Article › Scientific › peer-review

Original language	Undefined/Unknown
Pages (from-to)	1-7
Number of pages	7
Journal	International Journal of Photoenergy
Volume	2008
Publication status	Published - 2008

Keywords

@article{6e0a9f4ccb884c73bbfbded18a1362cc,

title = "Photoelectrochemical characterization of sprayed alpha-Fe2O3 thin films: influence of Si doping and SnO2 interfacial layer",

keywords = "professional journal papers, CWTS JFIS < 0.75",

author = "Y Liang and C.S. Enache and {van de Krol}, R",

year = "2008",

language = "Undefined/Unknown",

volume = "2008",

pages = "1--7",

journal = "International Journal of Photoenergy",

issn = "1110-662X",

publisher = "Hindawi Publishing Corporation",

}

TY - JOUR

T1 - Photoelectrochemical characterization of sprayed alpha-Fe2O3 thin films: influence of Si doping and SnO2 interfacial layer

AU - Liang, Y

AU - Enache, C.S.

AU - van de Krol, R

PY - 2008

Y1 - 2008

KW - professional journal papers

KW - CWTS JFIS < 0.75

M3 - Article

SN - 1110-662X

VL - 2008

SP - 1

EP - 7

JO - International Journal of Photoenergy

JF - International Journal of Photoenergy

ER -