Photoresist coating methods for the integration of novel 3-D RF microstructures

NP Pham, E Boellaard, JN Burghartz, PM Sarro

Research output: Contribution to journal › Article › Scientific › peer-review

Original language	Undefined/Unknown
Pages (from-to)	491-499
Number of pages	9
Journal	IEEE Journal of Microelectromechanical Systems
Volume	13
Issue number	3
Publication status	Published - 2004

Keywords

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title = "Photoresist coating methods for the integration of novel 3-D RF microstructures",

keywords = "ZX CWTS JFIS >= 3.00",

author = "NP Pham and E Boellaard and JN Burghartz and PM Sarro",

year = "2004",

language = "Undefined/Unknown",

volume = "13",

pages = "491--499",

journal = "IEEE Journal of Microelectromechanical Systems",

issn = "1057-7157",

publisher = "Institute of Electrical and Electronics Engineers (IEEE)",

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}

TY - JOUR

T1 - Photoresist coating methods for the integration of novel 3-D RF microstructures

AU - Pham, NP

AU - Boellaard, E

AU - Burghartz, JN

AU - Sarro, PM

PY - 2004

Y1 - 2004

KW - ZX CWTS JFIS >= 3.00

M3 - Article

SN - 1057-7157

VL - 13

SP - 491

EP - 499

JO - IEEE Journal of Microelectromechanical Systems

JF - IEEE Journal of Microelectromechanical Systems

IS - 3

ER -