Plasma-assisted atomic layer deposition of TiN films at low deposition temperature for high-aspect ratio applications

SBS Heil, E Langereis, F Roozeboom, A Kemmeren, NP Pham, PM Sarro, MCM van de Sanden, WMM Kessels

Research output: Chapter in Book/Conference proceedings/Edited volumeConference contributionScientificpeer-review

Original languageUndefined/Unknown
Title of host publicationMaterials, Technology and Reliability of Advanced Interconnects 2005
EditorsPR Besser, AJ McKerrow, F Iacopi, CP Wong, J Vlassak
Place of PublicationWarrendale
PublisherMaterials Research Society
PagesB6.4.1-B6.4.6
Publication statusPublished - 2005
EventMRS Spring meeting 2005, San Francisco - Warrendale
Duration: 28 Mar 20051 Apr 2005

Publication series

Name
PublisherMaterials Research Society
NameMaterials Research Society Symposium Proceedings
Volume863
ISSN (Print)0272-9172

Conference

ConferenceMRS Spring meeting 2005, San Francisco
Period28/03/051/04/05

Keywords

  • conference contrib. refereed
  • Conf.proc. > 3 pag

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