Plasma-enhanced atomic layer deposition of titania on alumina for its potential use as a hydrogen-selective membrane

THY Tran, WG Haije, V Longo, WMM Kessels, J Schoonman

Research output: Contribution to journalArticleScientificpeer-review

10 Citations (Scopus)
Original languageEnglish
Pages (from-to)438-443
Number of pages6
JournalJournal of Membrane Science
Volume378
Issue number1-2
Publication statusPublished - 2011

Keywords

  • professional journal papers
  • CWTS 0.75 <= JFIS < 2.00

Cite this

Tran, THY., Haije, WG., Longo, V., Kessels, WMM., & Schoonman, J. (2011). Plasma-enhanced atomic layer deposition of titania on alumina for its potential use as a hydrogen-selective membrane. Journal of Membrane Science, 378(1-2), 438-443.