Plasma-enhanced chemical vapor deposition of thick silicon nitride films with low stress on inP.

L Shi, CAM Steenbergen, AH de Vreede, MK Smit, TLM Scholtes, FH Groen, JW Pedersen

Research output: Contribution to journalArticleScientificpeer-review

14 Citations (Scopus)
Original languageUndefined/Unknown
Pages (from-to)471-473
Number of pages3
JournalJournal of Vacuum Science and Technology. Part A: International Journal Devoted to Vacuum, Surfaces, and Films
Publication statusPublished - 1996

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