Plasma induced charging damage of gate oxides.

RG van Veen, AH Verbruggen, EWJM van der Drift, S Radelaar, S Anders, HM Jaeger, Z Wang, P Tanner, C Salm, T Mouthaan, F Kuper, MSP Andriesse

Research output: Chapter in Book/Conference proceedings/Edited volumeConference contributionScientific

Original languageUndefined/Unknown
Title of host publication2nd Annual Workshop on Semiconductor Advances for Future Electronics (SAFE).
Publication statusPublished - 1999

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