Positive and Negative Photoconductivity in Ir Nanofilm-Coated MoO3 Bias-Switching Photodetector

Mohamed A. Basyooni*, Redouane En-nadir, Khalid Rahmani, Yasin Ramazan Eker*

*Corresponding author for this work

Research output: Contribution to journalArticleScientificpeer-review

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Abstract

In this study, we delved into the influence of Ir nanofilm coating thickness on the optical and optoelectronic behavior of ultrathin MoO3 wafer-scale devices. Notably, the 4 nm Ir coating showed a negative Hall voltage and high carrier concentration of 1.524 × 1019 cm−3 with 0.19 nm roughness. Using the Kubelka–Munk model, we found that the bandgap decreased with increasing Ir thickness, consistent with Urbach tail energy suggesting a lower level of disorder. Regarding transient photocurrent behavior, all samples exhibited high stability under both dark and UV conditions. We also observed a positive photoconductivity at bias voltages of >0.5 V, while at 0 V bias voltage, the samples displayed a negative photoconductivity behavior. This unique aspect allowed us to explore self-powered negative photodetectors, showcasing fast response and recovery times of 0.36/0.42 s at 0 V. The intriguing negative photoresponse that we observed is linked to hole self-trapping/charge exciton and Joule heating effects.
Original languageEnglish
Article number1860
Number of pages17
JournalMicromachines
Volume14
Issue number10
DOIs
Publication statusPublished - 2023

Keywords

  • molybdenum oxide
  • atomic layer deposition
  • sputtering deposition
  • urbach tail energy
  • low roughness optoelectronic devices

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