Post ML deposition correction of EUV mirrors/masks

M Singh (Inventor), JJM Braat (Inventor)

Research output: Patent

Original languageUndefined/Unknown
Patent numberUS 6.777.140 B2
IPCaanvrager: ASML Netherlands B.V.
Priority date17/08/04
Publication statusPublished - 2004

Keywords

  • Octrooi

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