| Original language | Undefined/Unknown |
|---|---|
| Patent number | US 6.777.140 B2 |
| IPC | aanvrager: ASML Netherlands B.V. |
| Priority date | 17/08/04 |
| Publication status | Published - 2004 |
Bibliographical note
aanvrager: ASML Netherlands B.V.Keywords
- Octrooi
Post ML deposition correction of EUV mirrors/masks
M Singh (Inventor), JJM Braat (Inventor)
Research output: Patent