Predicted effect of shot noise on contact hole dimension in e-beam lithography

P Kruit, S. Steenbrink, M.J.J. Wieland

    Research output: Contribution to journalArticleScientificpeer-review

    Original languageUndefined/Unknown
    Pages (from-to)2931-2935
    Number of pages5
    JournalJournal of Vacuum Science and Technology. Part B: Microelectronics and Nanometer Structures
    VolumeB 24
    Issue numberNov/Dec
    Publication statusPublished - 2006


    • academic journal papers
    • CWTS 0.75 <= JFIS < 2.00

    Cite this