Predicted effect of shot noise on contact hole dimension in e-beam lithography

P Kruit, S. Steenbrink, M.J.J. Wieland

Research output: Contribution to journalArticleScientificpeer-review

17 Citations (Scopus)
Original languageUndefined/Unknown
Pages (from-to)2931-2935
Number of pages5
JournalJournal of Vacuum Science and Technology. Part B: Microelectronics and Nanometer Structures
VolumeB 24
Issue numberNov/Dec
Publication statusPublished - 2006

Keywords

  • academic journal papers
  • CWTS 0.75 <= JFIS < 2.00

Cite this