Preparation of nanometer-scale windows in SiO2 for selective epitaxial growth of Si based divices

JWH Maes, PW Lukey, T Zijlstra, CCG Visser, J Caro, EWJM van der Drift, FD Tichelaar, S Radelaar

Research output: Contribution to journalArticleScientificpeer-review

1 Citation (Scopus)
Original languageUndefined/Unknown
Pages (from-to)321-324
Number of pages4
JournalMicroelectronic Engineering
Publication statusPublished - 1997

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