Process monitoring of excimer-laser crystallization of Si thin-films by electron backscattering pattern technique (EBSP)

Research output: Chapter in Book/Conference proceedings/Edited volume › Conference contribution › Professional

Original language	Undefined/Unknown
Title of host publication	Meeting handout
Place of Publication	S.l.
Publisher	s.n.
Pages	1-6
Number of pages	6
Publication status	Published - 2000
Event	Channel Users Meeting 2000, Sostrup Slot and Hobro - S.l. Duration: 15 Jun 2000 → 18 Jun 2000

Name
Publisher	S.n.

Conference	Channel Users Meeting 2000, Sostrup Slot and Hobro
Period	15/06/00 → 18/06/00

Keywords

@inproceedings{7101e4b990874067b7f5c69fc9eeba27,

title = "Process monitoring of excimer-laser crystallization of Si thin-films by electron backscattering pattern technique (EBSP)",

keywords = "ZX Int.klas.verslagjaar < 2002",

author = "R Ishihara",

year = "2000",

language = "Undefined/Unknown",

publisher = "s.n.",

pages = "1--6",

booktitle = "Meeting handout",

note = "Channel Users Meeting 2000, Sostrup Slot and Hobro ; Conference date: 15-06-2000 Through 18-06-2000",

}

TY - GEN

T1 - Process monitoring of excimer-laser crystallization of Si thin-films by electron backscattering pattern technique (EBSP)

AU - Ishihara, R

PY - 2000

Y1 - 2000

KW - ZX Int.klas.verslagjaar < 2002

M3 - Conference contribution

SP - 1

EP - 6

BT - Meeting handout

PB - s.n.

CY - S.l.

T2 - Channel Users Meeting 2000, Sostrup Slot and Hobro

Y2 - 15 June 2000 through 18 June 2000

ER -