Process simulation of laser crystallization and analysis of crystallization process of Si films

F Kimura, R Saito, S Tsukamoto, Y Hiroshima, M Dorfan, S Inoue, T Shimoda, R Ishihara, Y van Aandel

Research output: Chapter in Book/Conference proceedings/Edited volumeConference contributionScientificpeer-review

Original languageUndefined/Unknown
Title of host publicationIDW/AD '05 - Proceedings of the 12th international display workshops in conjunction with Asia display 2005
EditorsH Mimura
Place of Publications.l.
PublisherIDW/AD
Pages977-980
Number of pages4
Publication statusPublished - 2005
EventIDW/AD '05, 12th International Display Workshops in conjunction with Asia Display 2005, Takamatsu, Japan - s.l.
Duration: 6 Dec 20059 Dec 2005

Publication series

Name
PublisherIDW/AD

Conference

ConferenceIDW/AD '05, 12th International Display Workshops in conjunction with Asia Display 2005, Takamatsu, Japan
Period6/12/059/12/05

Keywords

  • Elektrotechniek
  • Techniek
  • conference contrib. refereed
  • Conf.proc. > 3 pag

Cite this

Kimura, F., Saito, R., Tsukamoto, S., Hiroshima, Y., Dorfan, M., Inoue, S., Shimoda, T., Ishihara, R., & van Aandel, Y. (2005). Process simulation of laser crystallization and analysis of crystallization process of Si films. In H. Mimura (Ed.), IDW/AD '05 - Proceedings of the 12th international display workshops in conjunction with Asia display 2005 (pp. 977-980). IDW/AD.