@inproceedings{ed52810353c743f0a201560cd584a30d,
title = "Projection lens testing with Moir{\'e} effect",
abstract = "The application of Moir{\'e} effect for testing of a lithographic projection lens is reported. The arrangement presented allows measuring magnification, distortion, field curvature and telecentricity of the lens and can be used for its fine tuning. The method is based on two matched two-dimensional gratings, positioned in mutually conjugated planes; one of them can be translated. Visual interpretation of Moir{\'e} fringe pattern allows quick diagnostics of position errors exceeding critical dimension, whereas lateral scanning is applied for measuring of smaller magnitude errors. Field curvature and telecentricity are measured by 3D scanning. Presented results are in a good agreement with those obtained elsewhere.",
keywords = "Distortion, Lithography, Moir{\'e} effect, Optical metrology, Projection lens",
author = "M. Loktev and Y. Shao",
year = "2017",
doi = "10.1117/12.2264343",
language = "English",
series = "Proceedings of SPIE",
publisher = "SPIE",
editor = "Sanchez, {Martha I.}",
booktitle = "Metrology, Inspection, and Process Control for Microlithography XXXI",
address = "United States",
note = "31st Conference on Metrology, Inspection, and Process Control for Microlithography 2017 ; Conference date: 27-02-2017 Through 02-03-2017",
}