Projection lens testing with Moiré effect

M. Loktev, Y. Shao

Research output: Chapter in Book/Conference proceedings/Edited volumeConference contributionScientificpeer-review

1 Citation (Scopus)
115 Downloads (Pure)

Abstract

The application of Moiré effect for testing of a lithographic projection lens is reported. The arrangement presented allows measuring magnification, distortion, field curvature and telecentricity of the lens and can be used for its fine tuning. The method is based on two matched two-dimensional gratings, positioned in mutually conjugated planes; one of them can be translated. Visual interpretation of Moiré fringe pattern allows quick diagnostics of position errors exceeding critical dimension, whereas lateral scanning is applied for measuring of smaller magnitude errors. Field curvature and telecentricity are measured by 3D scanning. Presented results are in a good agreement with those obtained elsewhere.

Original languageEnglish
Title of host publicationMetrology, Inspection, and Process Control for Microlithography XXXI
EditorsMartha I. Sanchez
Place of PublicationBellingham, WA, USA
PublisherSPIE
Number of pages8
ISBN (Electronic)978-1-510607415
DOIs
Publication statusPublished - 2017
Event31st Conference on Metrology, Inspection, and Process Control for Microlithography 2017 - San Jose, United States
Duration: 27 Feb 20172 Mar 2017

Publication series

NameProceedings of SPIE
Volume10145
ISSN (Electronic)1605-7422

Conference

Conference31st Conference on Metrology, Inspection, and Process Control for Microlithography 2017
CountryUnited States
CitySan Jose
Period27/02/172/03/17

Keywords

  • Distortion
  • Lithography
  • Moiré effect
  • Optical metrology
  • Projection lens

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