Property of single-crystalline Si TFTs fabricated with µ-Czochralski (Grain Filter) process

R Ishihara, PC van der Wilt, BD van Dijk, JW Metselaar, CIM Beenakker

Research output: Chapter in Book/Conference proceedings/Edited volume › Conference contribution › Scientific › peer-review

13 Citations (Scopus)

Original language	Undefined/Unknown
Title of host publication	Poly-silicon thin film transistor technology and applications in displays and other novel technology areas
Editors	AT Voutsas
Publisher	SPIE
Pages	10-19
Number of pages	10
Publication status	Published - 2003

Name
Publisher	SPIE-IS&T

Name	Proceedings of SPIE- International Society for Optical Engineering
Volume	5004
ISSN (Print)	0277-786X

Keywords

Ishihara, R., van der Wilt, PC., van Dijk, BD., Metselaar, JW., & Beenakker, CIM. (2003). Property of single-crystalline Si TFTs fabricated with µ-Czochralski (Grain Filter) process. In AT. Voutsas (Ed.), Poly-silicon thin film transistor technology and applications in displays and other novel technology areas (pp. 10-19). (Proceedings of SPIE- International Society for Optical Engineering; Vol. 5004). SPIE.

@inproceedings{5a752f59d7614a5d8971e1c593d83ce6,

title = "Property of single-crystalline Si TFTs fabricated with µ-Czochralski (Grain Filter) process",

keywords = "Conf.proc. > 3 pag",

author = "R Ishihara and {van der Wilt}, PC and {van Dijk}, BD and JW Metselaar and CIM Beenakker",

year = "2003",

language = "Undefined/Unknown",

publisher = "SPIE",

pages = "10--19",

editor = "AT Voutsas",

booktitle = "Poly-silicon thin film transistor technology and applications in displays and other novel technology areas",

address = "United States",

}

Ishihara, R, van der Wilt, PC, van Dijk, BD, Metselaar, JW & Beenakker, CIM 2003, Property of single-crystalline Si TFTs fabricated with µ-Czochralski (Grain Filter) process. in AT Voutsas (ed.), Poly-silicon thin film transistor technology and applications in displays and other novel technology areas. Proceedings of SPIE- International Society for Optical Engineering, vol. 5004, SPIE, pp. 10-19.

Property of single-crystalline Si TFTs fabricated with µ-Czochralski (Grain Filter) process. / Ishihara, R; van der Wilt, PC; van Dijk, BD et al.
Poly-silicon thin film transistor technology and applications in displays and other novel technology areas. ed. / AT Voutsas. SPIE, 2003. p. 10-19 (Proceedings of SPIE- International Society for Optical Engineering; Vol. 5004).

Research output: Chapter in Book/Conference proceedings/Edited volume › Conference contribution › Scientific › peer-review

TY - GEN

T1 - Property of single-crystalline Si TFTs fabricated with µ-Czochralski (Grain Filter) process

AU - Ishihara, R

AU - van der Wilt, PC

AU - van Dijk, BD

AU - Metselaar, JW

AU - Beenakker, CIM

PY - 2003

Y1 - 2003

KW - Conf.proc. > 3 pag

M3 - Conference contribution

SP - 10

EP - 19

BT - Poly-silicon thin film transistor technology and applications in displays and other novel technology areas

A2 - Voutsas, AT

PB - SPIE

ER -

Ishihara R, van der Wilt PC, van Dijk BD, Metselaar JW, Beenakker CIM. Property of single-crystalline Si TFTs fabricated with µ-Czochralski (Grain Filter) process. In Voutsas AT, editor, Poly-silicon thin film transistor technology and applications in displays and other novel technology areas. SPIE. 2003. p. 10-19. (Proceedings of SPIE- International Society for Optical Engineering).