Quantum inspire - Qutech's platform for co-development and collaboration in quantum computing

Thorsten Last*, Nodar Samkharadze, Pieter Eendebak, Richard Versluis, Xiao Xue, Amir Sammak, Delphine Brousse, Kelvin Loh, Henk Polinder, Giordano Scappucci, Menno Veldhorst, Lieven Vandersypen, Klára Maturová, Jeremy Veltin, Garrelt Alberts

*Corresponding author for this work

Research output: Chapter in Book/Conference proceedings/Edited volumeConference contributionScientificpeer-review

3 Citations (Scopus)
11 Downloads (Pure)

Abstract

The mission of QuTech is to bring quantum technology to industry and society by translating fundamental scientific research into applied research. To this end we are developing Quantum Inspire (QI), a full-stack quantum computer prototype for future co-development and collaborative R&D in quantum computing. A prerelease of this prototype system is already offering the public cloud-based access to QuTech technologies such as a programmable quantum computer simulator (with up to 31 qubits) and tutorials and user background knowledge on quantum information science (www.quantum-inspire.com). Access to a programmable CMOS-compatible Silicon spin qubit-based quantum processor will be provided in the next deployment phase. The first generation of QI's quantum processors consists of a double quantum dot hosted in an in-house grown SiGe/28Si/SiGe heterostructure, and defined with a single layer of Al gates. Here we give an overview of important aspects of the QI full-stack. We illustrate QI's modular system architecture and we will touch on parts of the manufacturing and electrical characterization of its first generation two spin qubit quantum processor unit. We close with a section on QI's qubit calibration framework. The definition of a single qubit Pauli X gate is chosen as concrete example of the matching of an experiment to a component of the circuit model for quantum computation.

Original languageEnglish
Title of host publicationNovel Patterning Technologies for Semiconductors, MEMS/NEMS and MOEMS 2020
EditorsMartha I. Sanchez, Eric M. Panning
PublisherSPIE
Number of pages12
Volume11324
ISBN (Electronic)9781510634152
DOIs
Publication statusPublished - 2020
EventNovel Patterning Technologies for Semiconductors, MEMS/NEMS and MOEMS 2020 - San Jose, United States
Duration: 24 Feb 202027 Feb 2020

Publication series

NameProceedings of SPIE - The International Society for Optical Engineering
Volume11324
ISSN (Print)0277-786X
ISSN (Electronic)1996-756X

Conference

ConferenceNovel Patterning Technologies for Semiconductors, MEMS/NEMS and MOEMS 2020
Country/TerritoryUnited States
CitySan Jose
Period24/02/2027/02/20

Bibliographical note

Green Open Access added to TU Delft Institutional Repository ‘You share, we take care!’ – Taverne project https://www.openaccess.nl/en/you-share-we-take-care Otherwise as indicated in the copyright section: the publisher is the copyright holder of this work and the author uses the Dutch legislation to make this work public.

Keywords

  • CMOS
  • Quantum computer
  • Quantum device manufacturing
  • Spin qubit in silicon

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