Reaction-diffusion analysis for one-step plasma etching and bonding of microfluidic devices

Research output: Contribution to journalArticleScientificpeer-review

3 Citations (Scopus)
Original languageEnglish
Pages (from-to)174102-1-174102-3
JournalApplied Physics Letters
Volume98
Publication statusPublished - 2011

Keywords

  • CWTS 0.75 <= JFIS < 2.00

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