Reaction-diffusion analysis for one-step plasma etching and bonding of microfluidic devices

M Rosso, V van Steijn, LCPM de Smet, EJR Sudholter, CR Kleijn, MT Kreutzer

Research output: Contribution to journal › Article › Scientific › peer-review

Keywords

@article{e8a9590775004133840b8f9bdd05bdc4,

title = "Reaction-diffusion analysis for one-step plasma etching and bonding of microfluidic devices",

keywords = "CWTS 0.75 <= JFIS < 2.00",

author = "M Rosso and {van Steijn}, V and {de Smet}, LCPM and EJR Sudholter and CR Kleijn and MT Kreutzer",

year = "2011",

language = "English",

volume = "98",

pages = "174102--1--174102--3",

journal = "Applied Physics Letters",

issn = "0003-6951",

publisher = "American Institute of Physics Publising LLC",

}

TY - JOUR

T1 - Reaction-diffusion analysis for one-step plasma etching and bonding of microfluidic devices

AU - Rosso, M

AU - van Steijn, V

AU - de Smet, LCPM

AU - Sudholter, EJR

AU - Kleijn, CR

AU - Kreutzer, MT

PY - 2011

Y1 - 2011

KW - CWTS 0.75 <= JFIS < 2.00

M3 - Article

SN - 0003-6951

VL - 98

SP - 174102-1-174102-3

JO - Applied Physics Letters

JF - Applied Physics Letters

ER -