Reactive Ion Etchin of metal stack consisting of an aluminium ally, WGe barrier and Ti adhesion layer

E Sabouret, C Schaffnit, JF Jongste, GCAM Janssen, S Radelaar

Research output: Contribution to journal › Article › Scientific › peer-review

Original language	Undefined/Unknown
Pages (from-to)	353-363
Number of pages	11
Journal	Microelectronic Engineering
Volume	37/38
Publication status	Published - 1997

Cite this

@article{eb0943fdd42e45e490264d8a21babf8c,

title = "Reactive Ion Etchin of metal stack consisting of an aluminium ally, WGe barrier and Ti adhesion layer",

author = "E Sabouret and C Schaffnit and JF Jongste and GCAM Janssen and S Radelaar",

year = "1997",

language = "Undefined/Unknown",

volume = "37/38",

pages = "353--363",

journal = "Microelectronic Engineering",

issn = "0167-9317",

publisher = "Elsevier",

}