Reactive magnetron sputter-deposition of NbN and (Nb, Ti)N films related to sputtering source characterization and optimization.

N Iossad, BD Jackson, SN Polyakov, PN Dmitriev, TM Klapwijk

Research output: Contribution to journal › Article › Scientific › peer-review

Original language	Undefined/Unknown
Pages (from-to)	1840-1845
Number of pages	6
Journal	Journal of Vacuum Science and Technology. Part A: International Journal Devoted to Vacuum, Surfaces, and Films
Volume	19
Issue number	4
Publication status	Published - 2001

Keywords

@article{d590393ffc1d450fb0ba77f28803ff38,

title = "Reactive magnetron sputter-deposition of NbN and (Nb, Ti)N films related to sputtering source characterization and optimization.",

keywords = "ZX Int.klas.verslagjaar < 2002",

author = "N Iossad and BD Jackson and SN Polyakov and PN Dmitriev and TM Klapwijk",

year = "2001",

language = "Undefined/Unknown",

volume = "19",

pages = "1840--1845",

journal = "Journal of Vacuum Science and Technology. Part A: International Journal Devoted to Vacuum, Surfaces, and Films",

issn = "0734-2101",

publisher = "AVS Science and Technology Society",

number = "4",

}

Research output: Contribution to journal › Article › Scientific › peer-review

TY - JOUR

T1 - Reactive magnetron sputter-deposition of NbN and (Nb, Ti)N films related to sputtering source characterization and optimization.

AU - Iossad, N

AU - Jackson, BD

AU - Polyakov, SN

AU - Dmitriev, PN

AU - Klapwijk, TM

PY - 2001

Y1 - 2001

KW - ZX Int.klas.verslagjaar < 2002

M3 - Article

SN - 0734-2101

VL - 19

SP - 1840

EP - 1845

JO - Journal of Vacuum Science and Technology. Part A: International Journal Devoted to Vacuum, Surfaces, and Films

JF - Journal of Vacuum Science and Technology. Part A: International Journal Devoted to Vacuum, Surfaces, and Films

IS - 4

ER -