Reactive sputter deposition of aluminium nitride thin films as heat spreaders in IC processes

H Schellevis, L la Spina, N Nenadovic, LK Nanver

Research output: Chapter in Book/Conference proceedings/Edited volumeConference contributionScientificpeer-review

Original languageUndefined/Unknown
Title of host publicationProceedings of the conference "Reactive sputter processes and related phenomena"
Editors s.n.
Place of PublicationDelft
PublisherNevac, Belvac, TU Delft
Pages1-1
Number of pages1
Publication statusPublished - 2005
EventReactive Sputter Deposition 2005, The conference "Reactive Sputter Processes and Related Phenomena", Delft, The Netherlands - Delft
Duration: 8 Dec 20059 Dec 2005

Publication series

Name
PublisherNevac, Belvac, TU Delft

Conference

ConferenceReactive Sputter Deposition 2005, The conference "Reactive Sputter Processes and Related Phenomena", Delft, The Netherlands
Period8/12/059/12/05

Keywords

  • conference contrib. refereed
  • Geen BTA classificatie

Cite this

Schellevis, H., la Spina, L., Nenadovic, N., & Nanver, LK. (2005). Reactive sputter deposition of aluminium nitride thin films as heat spreaders in IC processes. In s.n. (Ed.), Proceedings of the conference "Reactive sputter processes and related phenomena" (pp. 1-1). Nevac, Belvac, TU Delft.