Realizing the Potential of RF-Sputtered Hydrogenated Fluorine-Doped Indium Oxide as an Electrode Material for Ultrathin SiO x/Poly-Si Passivating Contacts

Can Han*, Guangtao Yang, Ana Montes, Paul Procel, Luana Mazzarella, Yifeng Zhao, Stephan Eijt, Henk Schut, Xiaodan Zhang, Miro Zeman, Olindo Isabella

*Corresponding author for this work

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