Recent developments in coherent Fourier scatterometry

Anubhav Paul; Sarika Soman; Silvania F. Pereira

doi:10.1051/epjconf/202533503041

Recent developments in coherent Fourier scatterometry

Anubhav Paul^*, Sarika Soman, Silvania F. Pereira

^*Corresponding author for this work

ImPhys/Pereira group

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Abstract

Coherent Fourier Scatterometry (CFS) enables low-power, high- resolution, non-destructive metrology for nanoscale structures. Recent advancements have extended its applications to improving the measurement of critical dimensions, such as steep-sidewall angles of fabricated nanostructures and the detection and shape determination of defects for semiconductor and power electronics applications. Innovations like beam scanning, multi-beam setups, and synthetic optical holography enhance its speed and sensitivity, making CFS increasingly viable for industrial in-line inspection.

Original language	English
Article number	03041
Number of pages	2
Journal	EPJ Web of Conferences
Volume	335
DOIs	https://doi.org/10.1051/epjconf/202533503041
Publication status	Published - 2025
Event	2025 European Optical Society Annual Meeting, EOSAM 2025 - Delft, Netherlands Duration: 24 Aug 2025 → 28 Aug 2025

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epjconf_eosam2025_03041Final published version, 1.08 MBLicence: CC BY

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title = "Recent developments in coherent Fourier scatterometry",

abstract = "Coherent Fourier Scatterometry (CFS) enables low-power, high- resolution, non-destructive metrology for nanoscale structures. Recent advancements have extended its applications to improving the measurement of critical dimensions, such as steep-sidewall angles of fabricated nanostructures and the detection and shape determination of defects for semiconductor and power electronics applications. Innovations like beam scanning, multi-beam setups, and synthetic optical holography enhance its speed and sensitivity, making CFS increasingly viable for industrial in-line inspection.",

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AB - Coherent Fourier Scatterometry (CFS) enables low-power, high- resolution, non-destructive metrology for nanoscale structures. Recent advancements have extended its applications to improving the measurement of critical dimensions, such as steep-sidewall angles of fabricated nanostructures and the detection and shape determination of defects for semiconductor and power electronics applications. Innovations like beam scanning, multi-beam setups, and synthetic optical holography enhance its speed and sensitivity, making CFS increasingly viable for industrial in-line inspection.

UR - https://www.scopus.com/pages/publications/105019056863

U2 - 10.1051/epjconf/202533503041

DO - 10.1051/epjconf/202533503041

M3 - Conference article

AN - SCOPUS:105019056863

SN - 2101-6275

VL - 335

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T2 - 2025 European Optical Society Annual Meeting, EOSAM 2025

Y2 - 24 August 2025 through 28 August 2025

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Recent developments in coherent Fourier scatterometry

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