Recombination reduction at the c-Si/RCA oxide interface through Ar-H2 plasma treatment

Kees Landheer, Paula C P Bronsveld, Ioannis Poulios, Frans D. Tichelaar, Monja Kaiser, Ruud E I Schropp*, Jatin K. Rath

*Corresponding author for this work

    Research output: Contribution to journalLetterScientificpeer-review

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