@inproceedings{051e9e36eb0345f59e5ded0d5eab81a1,
title = "Refinement strategies for optimal inclusion of prior information in ptychography",
abstract = "The imaging and inspection of extreme ultraviolet (EUV) masks is an important aspect of EUV lithography. The availability of actinic mask inspection tools able to generate highly resolved defect maps of defective EUV layouts is needed to ensure defect-free wafer prints. The technological interest towards phase-shift absorber materials for the next generation of EUV masks, and the associated need for phase metrology at the absorber level, makes phase retrieval methods a particularly interesting option for actinic inspection. In this work we use ptychography as an inspection tool for EUV masks. We show how variational and statistical methods can be employed to include a-priori information in the ptychographic inverse problem and how to cluster different update rules - stemming from the minimization of appropriate cost functionals - to optimally include prior information in ptychography under Poisson noise. ",
keywords = "EUV lithography, Mask inspection, Optimization, Phase retrieval, Prior information, Ptychography",
author = "Paolo Ansuinelli and Coene, {Wim M.} and Urbach, {H. P.}",
year = "2020",
doi = "10.1117/12.2572019",
language = "English",
volume = "11517",
series = "Proceedings of SPIE - The International Society for Optical Engineering",
publisher = "SPIE",
editor = "Naulleau, {Patrick P.} and Gargini, {Paolo A.} and Toshiro Itani and Ronse, {Kurt G.}",
booktitle = "Extreme Ultraviolet Lithography 2020",
address = "United States",
note = "Extreme Ultraviolet Lithography 2020 ; Conference date: 21-09-2020 Through 25-09-2020",
}