Residue-free plasma etching of polyimide coatings for small pitch vias with improved step coverage

BAZ Mimoun, HTM Pham, V Henneken, R Dekker

Research output: Contribution to journalArticleScientificpeer-review

22 Citations (Scopus)
Original languageEnglish
Pages (from-to)1-6
Number of pages6
JournalJournal of Vacuum Science and Technology. Part B: Microelectronics and Nanometer Structures
Volume31
Issue number2
DOIs
Publication statusPublished - 2013

Bibliographical note

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Article number: 021201

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