Resist and Exposure Processes for Sub-10-nm Electron and Ion Beam Lithography

VA Sidorkin

Research output: ThesisDissertation (TU Delft)

Original languageUndefined/Unknown
QualificationDoctor of Philosophy
Awarding Institution
  • Delft University of Technology
  • Salemink, Huub, Supervisor
  • Kruit, P., Advisor
  • van der Drift, E.W.J.M., Advisor
Award date6 Jul 2010
Place of PublicationDelft
Print ISBNs978-90-8593-078-6
Publication statusPublished - 2010


  • Diss. prom. aan TU Delft

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