@inbook{fedd83ad429340b39c7ab3cf08a9a56b,
title = "Resist assisted patterning",
abstract = "Helium ion beam lithography (HIL) has been demonstrated as a promising alternative to electron beam lithography (EBL) for R&D purposes, offering high-resolution lithography at high pattern densities. This chapter reviews focused He ion beam lithography, providing a detailed discussion on the ion beam-resist interaction mechanisms and latest experimental results in this field. In addition, impact of ion shot noise is examined, a comparison to He-ion beam milling is made, and future directions are mentioned.",
author = "Nima Kalhor and Alkemade, {Paul F.A.}",
year = "2016",
doi = "10.1007/978-3-319-41990-9_16",
language = "English",
isbn = "978-3319419886 ",
series = "NanoScience and Technology",
publisher = "Springer",
pages = "395--414",
editor = "G. Hlawacek and A. G{\"o}lzh{\"a}user",
booktitle = "Helium Ion Microscopy (NanoScience and Technology)",
}