Resist thickness effects on ultra thin HSQ patterning capabilities

VA Sidorkin, AE Grigorescu, HWM Salemink, EWJM van der Drift

Research output: Contribution to journal › Article › Scientific › peer-review

Original language	Undefined/Unknown
Pages (from-to)	749-751
Number of pages	3
Journal	Microelectronic Engineering
Volume	86
Issue number	4-6
Publication status	Published - 2009

Keywords

@article{5ba446188e6b4e78895fc7624aa17bfb,

title = "Resist thickness effects on ultra thin HSQ patterning capabilities",

keywords = "academic journal papers, CWTS JFIS < 0.75",

author = "VA Sidorkin and AE Grigorescu and HWM Salemink and {van der Drift}, EWJM",

year = "2009",

language = "Undefined/Unknown",

volume = "86",

pages = "749--751",

journal = "Microelectronic Engineering",

issn = "0167-9317",

publisher = "Elsevier",

number = "4-6",

}

TY - JOUR

T1 - Resist thickness effects on ultra thin HSQ patterning capabilities

AU - Sidorkin, VA

AU - Grigorescu, AE

AU - Salemink, HWM

AU - van der Drift, EWJM

PY - 2009

Y1 - 2009

KW - academic journal papers

KW - CWTS JFIS < 0.75

M3 - Article

SN - 0167-9317

VL - 86

SP - 749

EP - 751

JO - Microelectronic Engineering

JF - Microelectronic Engineering

IS - 4-6

ER -