Resists for sub-20-nm electron beam lithography with a focus on HSQ: state of the art

AE Grigorescu, CW Hagen

    Research output: Contribution to journalArticleScientificpeer-review

    Original languageUndefined/Unknown
    Pages (from-to)292001-292001
    Number of pages1
    JournalNanotechnology
    Volume20
    Publication statusPublished - 2009

    Keywords

    • CWTS 0.75 <= JFIS < 2.00

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