Resolution enhancement in extreme ultraviolet lithography: the imaging of a 2-D reflecting phase shifting mask with conical illumination.

AM Nugrowati, AS van de Nes, SF Pereira, JJM Braat

Research output: Chapter in Book/Conference proceedings/Edited volumeConference contributionScientificpeer-review

Original languageUndefined/Unknown
Title of host publicationEOS Topical Meeting on Micro-Optics, Diffractive Optics and Optical MEMS.
EditorsH-P. Herzig
Place of PublicationHannover
PublisherEOS
Pages110-111
Number of pages2
ISBN (Print)3-00-019532-7
Publication statusPublished - 2006
EventEOS Topical Meeting - Paris - Hannover
Duration: 17 Oct 200619 Oct 2006

Publication series

Name
PublisherEOS
Name
VolumeTOM4

Conference

ConferenceEOS Topical Meeting - Paris
Period17/10/0619/10/06

Keywords

  • conference contrib. refereed
  • Geen BTA classificatie

Cite this

Nugrowati, AM., van de Nes, AS., Pereira, SF., & Braat, JJM. (2006). Resolution enhancement in extreme ultraviolet lithography: the imaging of a 2-D reflecting phase shifting mask with conical illumination. In H-P. Herzig (Ed.), EOS Topical Meeting on Micro-Optics, Diffractive Optics and Optical MEMS. (pp. 110-111). EOS.