Resolution enhancement in extreme ultraviolet lithography: the imaging of a 2-D reflecting phase shifting mask with conical illumination.

AM Nugrowati; AS van de Nes; SF Pereira; JJM Braat

Resolution enhancement in extreme ultraviolet lithography: the imaging of a 2-D reflecting phase shifting mask with conical illumination.

AM Nugrowati, AS van de Nes, SF Pereira, JJM Braat

ImPhys/Optics

Research output: Chapter in Book/Conference proceedings/Edited volume › Conference contribution › Scientific › peer-review

Original language	Undefined/Unknown
Title of host publication	EOS Topical Meeting on Micro-Optics, Diffractive Optics and Optical MEMS.
Editors	H-P. Herzig
Place of Publication	Hannover
Publisher	EOS
Pages	110-111
Number of pages	2
ISBN (Print)	3-00-019532-7
Publication status	Published - 2006
Event	EOS Topical Meeting - Paris - Hannover Duration: 17 Oct 2006 → 19 Oct 2006

Publication series

Name
Publisher	EOS

Name
Volume	TOM4

Conference

Conference	EOS Topical Meeting - Paris
Period	17/10/06 → 19/10/06

Keywords

conference contrib. refereed
Geen BTA classificatie

Cite this

@inproceedings{f3eaa2c11f644f3aa2fee498debbcfa9,

title = "Resolution enhancement in extreme ultraviolet lithography: the imaging of a 2-D reflecting phase shifting mask with conical illumination.",

keywords = "conference contrib. refereed, Geen BTA classificatie",

author = "AM Nugrowati and {van de Nes}, AS and SF Pereira and JJM Braat",

year = "2006",

language = "Undefined/Unknown",

isbn = "3-00-019532-7",

publisher = "EOS",

pages = "110--111",

editor = "H-P. Herzig",

booktitle = "EOS Topical Meeting on Micro-Optics, Diffractive Optics and Optical MEMS.",

note = "null ; Conference date: 17-10-2006 Through 19-10-2006",

}

Resolution enhancement in extreme ultraviolet lithography: the imaging of a 2-D reflecting phase shifting mask with conical illumination. / Nugrowati, AM; van de Nes, AS; Pereira, SF; Braat, JJM.

EOS Topical Meeting on Micro-Optics, Diffractive Optics and Optical MEMS.. ed. / H-P. Herzig. Hannover : EOS, 2006. p. 110-111.

Research output: Chapter in Book/Conference proceedings/Edited volume › Conference contribution › Scientific › peer-review

TY - GEN

T1 - Resolution enhancement in extreme ultraviolet lithography: the imaging of a 2-D reflecting phase shifting mask with conical illumination.

AU - Nugrowati, AM

AU - van de Nes, AS

AU - Pereira, SF

AU - Braat, JJM

PY - 2006

Y1 - 2006

KW - conference contrib. refereed

KW - Geen BTA classificatie

M3 - Conference contribution

SN - 3-00-019532-7

SP - 110

EP - 111

BT - EOS Topical Meeting on Micro-Optics, Diffractive Optics and Optical MEMS.

A2 - Herzig, H-P.

PB - EOS

CY - Hannover

Y2 - 17 October 2006 through 19 October 2006

ER -