Role of atomic layer deposited aluminum oxide as oxidation barrier for silicon based materials

G Fiorentino, B Morana, S Forte, PM Sarro

Research output: Contribution to journalArticleScientificpeer-review

3 Citations (Scopus)
Original languageEnglish
Pages (from-to)1-9
Number of pages9
JournalJournal of Vacuum Science and Technology. Part A: International Journal Devoted to Vacuum, Surfaces, and Films
Issue numberart. 01A142
Publication statusPublished - 2015

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