Roughness treatment of silicon surface after Deep Reactive Ion Etching

HTM Pham, CR de Boer, PM Sarro

Research output: Chapter in Book/Conference proceedings/Edited volumeConference contributionScientificpeer-review

Original languageUndefined/Unknown
Title of host publicationSAFE 2007 Semiconductor advances for future electornics
Editors s.n.
Place of PublicationVeldhoven, The Netherlands
PublisherSTW
Pages535-538
Number of pages4
ISBN (Print)978-90-73461-49-9
Publication statusPublished - 2007

Publication series

Name
PublisherSTW

Keywords

  • Elektrotechniek
  • Techniek
  • conference contrib. refereed
  • Vakpubl., Overig wet. > 3 pag

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