Schottky barrier height modulation by ultra-shallow low-dose dopant diffusion

M Popadic; LK Nanver; TLM Scholtes

Schottky barrier height modulation by ultra-shallow low-dose dopant diffusion

M Popadic, LK Nanver, TLM Scholtes

Electronic Components, Technology and Materials

Research output: Chapter in Book/Conference proceedings/Edited volume › Conference contribution › Scientific › peer-review

4 Citations (Scopus)

Original language	Undefined/Unknown
Title of host publication	8th International Conference on Solid-State and Integrated Circuit Technology Proceedings
Editors	s.n.
Place of Publication	Shanghai, China
Publisher	Electron Device Society
Pages	469-471
Number of pages	3
ISBN (Print)	1-4244-0160-7
Publication status	Published - 2006
Event	ICSICT 2006: 8th International Conference on Solid-State and Integrated Circuit Technology - Shanghai, China Duration: 23 Oct 2006 → 26 Oct 2006

Publication series

Name
Publisher	Electron Device Society

Name
Volume	4

Conference

Conference	ICSICT 2006
Country/Territory	China
City	Shanghai
Period	23/10/06 → 26/10/06

Keywords

conference contrib. refereed
Geen BTA classificatie

Cite this

@inproceedings{e59b2a1ab6d54fdb9784ef60fb8c2966,

title = "Schottky barrier height modulation by ultra-shallow low-dose dopant diffusion",

keywords = "conference contrib. refereed, Geen BTA classificatie",

author = "M Popadic and LK Nanver and TLM Scholtes",

year = "2006",

language = "Undefined/Unknown",

isbn = "1-4244-0160-7",

publisher = "Electron Device Society",

pages = "469--471",

editor = "s.n.",

booktitle = "8th International Conference on Solid-State and Integrated Circuit Technology Proceedings",

note = "ICSICT 2006 ; Conference date: 23-10-2006 Through 26-10-2006",

}

Schottky barrier height modulation by ultra-shallow low-dose dopant diffusion. / Popadic, M; Nanver, LK; Scholtes, TLM.
8th International Conference on Solid-State and Integrated Circuit Technology Proceedings. ed. / s.n. Shanghai, China: Electron Device Society, 2006. p. 469-471.

Research output: Chapter in Book/Conference proceedings/Edited volume › Conference contribution › Scientific › peer-review

TY - GEN

T1 - Schottky barrier height modulation by ultra-shallow low-dose dopant diffusion

AU - Popadic, M

AU - Nanver, LK

AU - Scholtes, TLM

PY - 2006

Y1 - 2006

KW - conference contrib. refereed

KW - Geen BTA classificatie

M3 - Conference contribution

SN - 1-4244-0160-7

SP - 469

EP - 471

BT - 8th International Conference on Solid-State and Integrated Circuit Technology Proceedings

A2 - s.n., null

PB - Electron Device Society

CY - Shanghai, China

T2 - ICSICT 2006

Y2 - 23 October 2006 through 26 October 2006

ER -