Secondary ion mass spectrometry and atomic force spectroscopy studies of surface roughening, erosion rate change and depth resolurion in Si during 1 keV 60 degrees O2+ bombardment with oxygen flooding

ZX Jiang; PFA Alkemade

Secondary ion mass spectrometry and atomic force spectroscopy studies of surface roughening, erosion rate change and depth resolurion in Si during 1 keV 60 degrees O2+ bombardment with oxygen flooding

ZX Jiang, PFA Alkemade

Research output: Contribution to journal › Article › Scientific › peer-review

Original language	Undefined/Unknown
Pages (from-to)	1971-1982
Number of pages	12
Journal	Journal of Vacuum Science and Technology. Part B: Microelectronics and Nanometer Structures
Volume	16
Issue number	4
Publication status	Published - 1998

Bibliographical note

ISSn: 0734211X

Cite this

@article{398e556e98454b18b57d8c44c8e8a9e2,

title = "Secondary ion mass spectrometry and atomic force spectroscopy studies of surface roughening, erosion rate change and depth resolurion in Si during 1 keV 60 degrees O2+ bombardment with oxygen flooding",

author = "ZX Jiang and PFA Alkemade",

note = "ISSn: 0734211X",

year = "1998",

language = "Undefined/Unknown",

volume = "16",

pages = "1971--1982",

journal = "Journal of Vacuum Science and Technology. Part B: Microelectronics and Nanometer Structures",

issn = "1071-1023",

publisher = "AVS Science and Technology Society",

number = "4",

}

Secondary ion mass spectrometry and atomic force spectroscopy studies of surface roughening, erosion rate change and depth resolurion in Si during 1 keV 60 degrees O2+ bombardment with oxygen flooding. / Jiang, ZX; Alkemade, PFA.
In: Journal of Vacuum Science and Technology. Part B: Microelectronics and Nanometer Structures, Vol. 16, No. 4, 1998, p. 1971-1982.

Research output: Contribution to journal › Article › Scientific › peer-review

TY - JOUR

T1 - Secondary ion mass spectrometry and atomic force spectroscopy studies of surface roughening, erosion rate change and depth resolurion in Si during 1 keV 60 degrees O2+ bombardment with oxygen flooding

AU - Jiang, ZX

AU - Alkemade, PFA

N1 - ISSn: 0734211X

PY - 1998

Y1 - 1998

M3 - Article

SN - 1071-1023

VL - 16

SP - 1971

EP - 1982

JO - Journal of Vacuum Science and Technology. Part B: Microelectronics and Nanometer Structures

JF - Journal of Vacuum Science and Technology. Part B: Microelectronics and Nanometer Structures

IS - 4

ER -